Nanolab Mask Aligner


  • Open by arrangement
  • Use after training
  • Use by agreement
  • Use with fee

Equipment Summary

The Karl Suss MA-6 Mask Aligner performs high resolution photolithography. It offers unsurpassed flexibility in the handling of irregularly shaped substrates of differing thickness, as well as standard size wafers up to 5’’ in diameter. It uses 4” masks system and it can be operated manually. All contact exposure programs (vacuum, hard, soft contact and proximity) are provided to print structures far into the submicron region.


Associated Groups